Controlling the flux of reactive species: a case study on thin film deposition in an aniline/argon plasma
Liste des publications Université d'Orléans
PDF] Fluorine negative ion density measurement in a dual frequency capacitive plasma etch reactor by cavity ring-down spectroscopy
Effects of gas pressure on plasma characteristics in dual frequency argon capacitive glow discharges at low pressure by a self-consistent fluid model
The Radial Distribution of Ions and Electrons in RF Inductively
The origin of isomerization of aniline revealed by high kinetic energy ion mobility spectrometry (HiKE-IMS) - Physical Chemistry Chemical Physics (RSC Publishing) DOI:10.1039/D2CP01994A
Poly (N-vinylpyrrolidone) modification mitigates plasma protein corona formation on phosphomolybdate-based nanoparticles, Journal of Nanobiotechnology
Controlling the flux of reactive species: a case study on thin film deposition in an aniline/argon plasma
The electron energy probability function (circles) obtained in the mid
Polymers, Free Full-Text
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Floating potentials of argon (a) and nitrogen (b) plasmas. Along the
Latest experimental and theoretical advances in the production of negative ions in caesium-free plasmas